ABOUT US
At Lawrence Semiconductor, we focus on providing our customers with custom semiconductor solutions to support their most challenging epitaxy development and production requirements. Epitaxy, or “epi,” is the process of depositing thin layers of crystalline films on semiconductor substrates—a critical step in producing advanced semiconductor devices. We specialize in epitaxial deposition of a wide range of silicon compounds and dopants on silicon wafers, including polysilicon, silicon germanium (SiGe), germanium tin (GeSn), pure boron (B), and isotopic silicon 28 (Si-28). These layers are crucial for creating high-performance semiconductor devices used in a variety of applications, from consumer electronics to AI datacenters.
Our team of epi engineers and process specialists has decades of experience supporting complex product development programs, and our fleet of chemical vapor deposition (CVD) reactors operating 24/7/365 enables us to provide our customers with high-volume semiconductor manufacturing services with rapid feedback and compressed order cycles.
Quality Commitment
We take great pride in providing quality services and solutions to the semiconductor industry since 1992. Our manufacturing team uses Statistical Process Controls (SPCs) to develop and produce the highest quality epitaxial wafers, with implementation of continuous improvement processes to exceed customer defined specifications and yields. Our facilities and equipment maintenance teams are on site 24/7 to ensure a safe and environmentally sound operation and workplace. Quality is our commitment!
Link to ISO certification: ISO 9001:2015 Certificate
Link to Terms & Conditions: Terms & Conditions
